Advanced Semiconductor

Sub-2nm Semiconductor Manufacturing: Emerging Technologies for Sustainable, Cost-Effective Chip Production
Advanced Semiconductor

Sub-2nm Semiconductor Manufacturing: Emerging Technologies for Sustainable, Cost-Effective Chip Production

Well, Many have concluded Moore's law has hit a wall a decade age, that's true to some extent but only in terms of the using Lithography tech used for decades from 1970s to 2020s. The totally new way of making nano devices are emerging using highly innovation techniques taking the integration and

8 min read
Atomic Layer Etching Breakthrough: APS Technology Targets 14 Ångstrom Semiconductor Nodes Without EUV
Advanced Semiconductor

Atomic Layer Etching Breakthrough: APS Technology Targets 14 Ångstrom Semiconductor Nodes Without EUV

The semiconductor industry, driven by the demand for smaller, more efficient chips, has relied on extreme ultraviolet (EUV) lithography to scale down to 2-nanometer processes. However, the high cost and complexity of EUV equipment, costing hundreds of millions, have limited its profitability for

5 min read
Smartkem and Manz Asia Announce Preliminary Joint Development Agreement for AI Chip Packaging Dielectric Ink Solutions
Advanced Semiconductor

Smartkem and Manz Asia Announce Preliminary Joint Development Agreement for AI Chip Packaging Dielectric Ink Solutions

Smartkem, a company focused on transistor technology, has entered into a preliminary, non-binding Joint Development Agreement (JDA) with Manz Asia, a developer of advanced packaging equipment for the semiconductor industry. The agreement, when finalized, will center on co-developing dielectric in

2 min read
Nano-ribbon/sheet Transistors in 2nm: Intel's Patent US20250212463A on Metal-All-Around Contact Structure for dense VLSI Semiconductor Chips
Advanced Semiconductor

Nano-ribbon/sheet Transistors in 2nm: Intel's Patent US20250212463A on Metal-All-Around Contact Structure for dense VLSI Semiconductor Chips

Interesting patent on fabricating 2nm and lower node semiconductor chips: The U.S. Patent Application Publication 20250212463, filed by Intel Corporation on December 20, 2023, and published on June 26, 2025, introduces a novel fabrication method and integrated circuit (IC) structure featuring a m

3 min read
Sustainable Semiconductor Manufacturing Through Wafer Reuse
Advanced Semiconductor

Sustainable Semiconductor Manufacturing Through Wafer Reuse

The semiconductor industry, vital to modern technology, consumes vast resources, using approximately 13,000 million square inches of silicon wafers annually to produce billions of chips. The chart below llustrates shipment growth from 2020 to 2024 reflects this escalating demand. Although silicon

6 min read
ELENA Project Advances Photonic Integrated Circuits with Europe’s First LNOI Platform
Advanced Semiconductor

ELENA Project Advances Photonic Integrated Circuits with Europe’s First LNOI Platform

The 42-month EU-funded ELENA project has concluded with the development of Europe’s first lithium niobate on insulator (LNOI) substrates for photonic integrated circuits (PICs), creating a fully European supply chain for thin-film lithium niobate (TFLN) technology. The €5 million initi

3 min read
New 3D fabrication process integrates Gallium Nitride transistors onto silicon chips
Compound Semiconductor

New 3D fabrication process integrates Gallium Nitride transistors onto silicon chips

Researchers from MIT and other institutions have developed a new method to integrate high-performance gallium nitride (GaN) transistors onto standard silicon CMOS chips. The process is low-cost, scalable, and compatible with existing semiconductor foundries, addressing the high cost and specializ

4 min read
University of Michigan study reveals safer method for synthesizing 2D Molybdenum Disulfide
Advanced Semiconductor

University of Michigan study reveals safer method for synthesizing 2D Molybdenum Disulfide

A research team at the University of Michigan has published a study in the Chemistry of Materials Journal demonstrating a new method for synthesizing high-quality two-dimensional (2D) molybdenum disulfide (MoS2) using Veeco Instruments Inc.’s Fiji G2 plasma-enhanced atomic layer deposition

2 min read
Imec and Tokyo Electron extend partnership for beyond-2nm semiconductor development
Advanced Semiconductor

Imec and Tokyo Electron extend partnership for beyond-2nm semiconductor development

Imec, a research hub in nanoelectronics and digital technologies, has extended its strategic partnership with Tokyo Electron (TEL), a Japanese supplier of semiconductor production equipment, for an additional five years. The agreement aims to advance joint research and development in next-generat

3 min read
Strategic materials conference 2025 to address semiconductor manufacturing innovations
Advanced Semiconductor

Strategic materials conference 2025 to address semiconductor manufacturing innovations

The Strategic Materials Conference (SMC) 2025, scheduled for June 23-25 at Hayes Mansion in San Jose, California, will focus on materials innovation for semiconductor manufacturing. The event will bring together executives and technology leaders to discuss trends and advancements in the field. Re

2 min read
IEEE ISCAS 2025 concludes in London with focus on cutting edge circuits and system innovations such as neural architecture
Advanced Semiconductor

IEEE ISCAS 2025 concludes in London with focus on cutting edge circuits and system innovations such as neural architecture

The IEEE International Symposium on Circuits and Systems (ISCAS) 2025, held from May 25 to May 28 in London, concluded successfully. As the flagship conference of the IEEE Circuits and Systems (CAS) Society, it served as a global forum for researchers in the theory, design, and implementation of

4 min read
3D semiconductor: Advancing SRAM scaling with 3D integration of 2D MoS₂ FETs
Advanced Semiconductor

3D semiconductor: Advancing SRAM scaling with 3D integration of 2D MoS₂ FETs

Static Random-Access Memory (SRAM) is a cornerstone of modern computing, critical for cache memory, buffers, and registers due to its high-speed performance and low power consumption. However, scaling SRAM to advanced semiconductor technology nodes faces significant hurdles, wit

10 min read
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