Advanced Semiconductor

University of Michigan study reveals safer method for synthesizing 2D Molybdenum Disulfide

A research team at the University of Michigan has published a study in the Chemistry of Materials Journal demonstrating a new method for synthesizing high-quality two-dimensional (2D) molybdenum disulfide (MoS2) using Veeco Instruments Inc.’s Fiji G2 plasma-enhanced atomic layer deposition (PEALD) system. The study, led by Professor of Chemistry, Materials Science, and Engineering Ageeth Bol, utilized di-tert-butyl disulfide (TBDS) as a safer alternative to hydrogen sulfide (H2S).
The research involved depositing MoS2 through a PEALD process with an organometallic precursor, TBDS, and hydrogen plasma. The resulting films exhibited comparable characteristics to those produced with H2S-based methods but avoided the hazards associated with H2S, a toxic gas requiring costly safety measures. The use of TBDS, a liquid precursor, offers a less hazardous and more cost-effective approach for producing 2D transition metal di-chalcogenides.
Ganesh Sundaram, vice president of technology for ALD and Molecular Beam Epitaxy at Veeco, noted that the method supports the potential for large-scale integration of 2D materials into commercial devices by addressing safety and cost challenges of traditional H2S-based processes. Professor Bol expressed satisfaction with the Fiji system’s performance and Veeco’s scientific support, adding that her group is commissioning a sec...

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