President Smt. Droupadi Murmu virtually inaugurated the Semiconductor Training Fabrication (Fab) Facility at the Centre for Nano Science and Engineering (CeNSE), Indian Institute of Science (IISc), on 3 June 2026. Prof. Govindan Rangarajan, Director of IISc, unveiled the commemorative plaque for the facility.
The facility was established with support from the Ministry of Tribal Affairs (MoTA). It aims to strengthen India’s semiconductor workforce and expand opportunities for tribal students.
Spanning 3,200 square feet, the cleanroom facility will offer hands-on training in semiconductor fabrication, microfabrication processes, cleanroom operations, device manufacturing, and characterization techniques. It is designed for workforce development and is expected to train up to 700 students annually through specialized semiconductor programmes.
The new Semiconductor Training Fab builds on CeNSE’s existing semiconductor skilling initiative. That programme has trained over 1,400 participants from Scheduled Tribe communities, delivered more than 48,000 hours of training, and awarded over 1,000 NSQF certifications across India.
CeNSE has received continued support from the Ministry of Electronics and Information Technology (MeitY) and the Ministry of Education, Government of India, for over a decade. The facility represents a step toward developing a skilled, inclusive, and industry-ready workforce for India’s semiconductor ecosystem.
