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Memory

NEO semiconductor introduces IGZO-based 3D X-DRAM with 1T1C and 3T0C cells for enhanced density and efficiency

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NEO Semiconductor announces the latest advancement in its 3D X-DRAM technology family. The industry-first 1T1C- and 3T0C-based 3D X-DRAM cells represent a transformative solution designed to deliver unprecedented density, power efficiency, and scalability for the most demanding data applications.

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Built on a 3D NAND-like architecture, the new 1T1C and 3T0C designs combine the performance of DRAM with the manufacturability of NAND, enabling cost-effective, high-yield production with densities up to 512Gb — a 10x improvement over conventional DRAM. Proof-of-concept test chips are expected in 2026.

“With the introduction of the 1T1C and 3T0C 3D X-DRAM, we are redefining what’s possible in memory technology,” said Andy Hsu, Founder & CEO of NEO Semiconductor. “This innovation pushes past the scaling limitations of today’s DRAM and positions NEO as a frontrunner in next-generation memory.”
Unmatched Retention and Efficiency: Thanks to IGZO channel technology, 1T1C and 3T0C cell simulations demonstrate retention times of up to 450 seconds, dramatically reducing refresh power.
    Verified by Simulation: TCAD (Technology Computer-Aided Design) simulations confirm fast 10-nanosecond read/write speeds and over 450-second retention time.
    Manufacturing-Friendly: Uses a modified 3D NAND process, with minimal changes, enabling full scalability and rapid integration into existing DRAM manufacturing lines.
    Ultra-High Bandwidth: Employs unique array architectures for hybrid bonding to significantly enhance memory bandwidth while reducing power consumption.
    High Performance for Advanced Workloads: Designed for AI, edge computing, and in-memory processing, with reliable high-speed access and reduced energy consumption.

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NEO Semiconductor’s technology platform now includes three 3D X-DRAM variants:

    1T1C (one transistor, one capacitor): The core solution for high-density DRAM, fully compatible with mainstream DRAM and HBM roadmaps.
    3T0C (three transistor, zero capacitor): Optimized for current-sensing operations, ideal for AI and in-memory computing.
    1T0C (one transistor, zero capacitor): A floating-body cell structure suitable for high-density DRAM, in-memory computing, hybrid memory and logic architectures.

For more information, visit https://neosemic.com.

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Srinivasa Reddy N

Editor, Electronics Engineering Herald


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