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Bruker Accelerates Photothermal AFM-IR Development for Semiconductor Research Challenges

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Bruker  announced accelerated development of its photothermal AFM-IR spectroscopy capabilities to address research needs in the semiconductor industry, where device architectures continue to shrink and systems grow more complex.

The company, identified as the largest supplier of nanoscale infrared (nanoIR) spectroscopy technology to the semiconductor industry, is extending AFM-IR use beyond its established application in nanoscale contamination analysis. The expanded focus covers EUV photoresist patterning and development, advanced materials for transistor scaling, and site-selective surface functionalization at the nanoscale for emerging sensing and functional device applications.

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In a Joint Development Project (JDP) with imec, a research and innovation hub in advanced semiconductor technologies, Bruker installed its Dimension IconIR system. The project evaluates the utility of photothermal AFM-IR for critical research questions, specifically how nanoscale chemical characterization can provide information on material behavior and interfaces affecting semiconductor process development and device performance.

Albert Minj, senior researcher at imec and project lead of the JDP, stated that metrology requirements for advanced semiconductor research are evolving rapidly. The collaboration assesses how nanoIR technology can meet emerging needs in nanoscale materials characterization. The IconIR system supports label-free chemical analysis with sub-5-nanometer resolution, aiding understanding of EUV resist chemistry and material interactions relevant to next-generation device concepts.

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David V. Rossi, President of Bruker’s Nano Surfaces and Metrology Division, noted that the collaboration with imec supports expansion of photothermal AFM-IR capabilities in semiconductor research environments. The work investigates complex material systems and interfaces, where nanoscale infrared spectroscopy offers chemical insights not accessible through conventional techniques.

The Dimension IconIR system is built on the Dimension Icon AFM platform and integrates photothermal AFM-IR modes for nanoscale chemical characterization.


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