The American Chemical Society (ACS) has named 13 current and former DuPont scientists and engineers as 2025 Heroes of Chemistry for their development of embedded barrier layer technology, a significant advancement in 193 nm immersion lithography. The team includes Deyan Wang, Ph.D., Cong Liu, Ph.D., Doris Kang, Ph.D., MingQi Li, Ph.D., Shintaro Yamada, Ph.D., Stefan Caporale, Chengbai Xu, Ph.D., George Barclay, Ph.D., ChunYi Wu, Joon Seok Oh, Li Jia, Jinrong Liu, and Anthony Zampini.
This technology has improved chip fabrication by increasing yield, reducing defects, and enhancing process efficiency. It integrates barrier functionality into the photoresist, simplifying lithography processes, reducing material usage, and lowering energy consumption. Widely adopted in the global semiconductor industry, the technology supports applications in artificial intelligence, advanced computing, and consumer electronics.
Randal King, Vice President of R&D/Technology, Qnity™, DuPont Electronics, noted that the technology, implemented over a decade ago, continues to be used in producing advanced, energy-efficient chips. The ACS Heroes of Chemistry Award, given annually to industrial scientists for impactful chemistry-based products, will formally recognize the team at a ceremony during the ACS Fall 2025 meeting in Washington, D.C.
DuPont scientists named 2025 heroes of chemistry for embedded barrier layer tech in semiconductor lithography
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