Nikon Corporation has begun accepting orders for the FPD lithography system FX-6ASLH, designed for high-definition OLED and LCD panels used in advanced smart devices. It achieves 0.85 µm (L/S) resolution, the first submicron resolution delivered by an FPD lithography system, according to Nikon.
Nikon says demand is growing for FPD lithography systems supporting G6 plates for small- and medium-sized panels, as displays for advanced smart devices move toward higher definition and greater functionality. Such systems are increasingly required to achieve resolution below 1.0 µm (L/S).
The FX-6ASLH uses a newly developed illumination optical system incorporating a UV-LED light source to achieve 0.85 µm (L/S) and 1.0 µm (C/H) resolution on G6 plates. Even on large plates that are more prone to distortion, it can expose the entire substrate with uniform linewidths while correcting focus in real time. The 0.85 µm resolution is achieved with a phase-shift mask and chemically amplified resist.
Key features include overlay accuracy of ±0.18 µm or better; a Nikon multi-lens system that controls multiple projection lenses to perform exposure as though using one large lens; UV-LED i-line equivalent illumination; 1:1 projection magnification; support for 1,500 mm × 1,850 mm plates; and a takt time of 39 s/plate under the stated 4-scan, i-line equivalent, 30 mJ/cm 2 conditions.
Nikon began accepting orders on October 26, 2026, and lists the sales launch for December 2027.
