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MacuSpec VF-TH 500: Advanced via fill chemistry for enhanced reliability in high-density interconnect PCBs

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MacDermid announces the launch of MacuSpec VF-TH 500. This high-performance via filling and simultaneous through hole acid copper electroplating process is designed to enhance the reliability of complex, High Density Interconnect Printed Circuit Boards for next-generation technologies.

The rapid growth in high-performance servers for AI applications, advanced automotive systems, and high-speed networking infrastructure is driving the demand for more complex, multilayer boards that must meet stringent reliability and performance requirements. MacuSpec VF-TH 500, the latest innovation in MacDermid Alpha’s award-winning MacuSpec VF-TH series, provides fabricators and OEMs with a versatile solution to meet these demands.

MacuSpec VF-TH 500 is engineered for HDI boards requiring simultaneous via filling and through hole plating with excellent microdistribution for panel plating and modified Semi-Additive Processing pattern plating. The chemistry delivers high via filling performance for via sizes up to 200 x 100 µm, ensuring a reliable deposit and improved throwing power at the knee and through hole.

This advanced chemistry enables more complex board designs in applications such as mSAP, high-reliability automotive, and high-performance computing.

“To meet the reliability and performance requirements for high-density interconnects, fabricators are often faced with challenges associated with large vias and complex via structures,” comments Dr. Kesheng Feng, Director of Metallization Research at MacDermid Alpha. “MacuSpec VF-TH 500 delivers outstanding results for mSAP with minimal copper addition to the surface. This enhances line/space reduction, boosts circuit density, and improves signal transmission. The process is highly versatile, meeting the needs of advanced fabricators.”

MacuSpec VF-TH 500 offers fabricators the following process benefits:

Panel, pattern, or button plating capability.
Compatibility with VCP or vertical hoist equipment.
Flexible options for both insoluble and soluble anode systems.
Seamless integration with direct metallization or electroless copper, ensuring reliable microvias with epitaxial growth across the interface.
 

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