U.S. Department of Commerce Finalizes $150 Million CHIPS Act Award to xLight for Free-Electron Laser EUV Lithography Prototype

WASHINGTON, D.C. — On June 2, 2026, the U.S. Department of Commerce and the National Institute of Standards and Technology (NIST) announced the signing of a final award of $150 million in federal incentives to xLight, Inc. under the CHIPS and Science Act.

The incentives are designated for the construction and demonstration of a first-of-its-kind free-electron laser (FEL) prototype, an alternative light source for extreme ultraviolet (EUV) lithography.

xLight’s FEL platform is designed to overcome physical bottlenecks in EUV lithography by providing greater power, increased efficiency and improved yield. The award will support prototype construction at the Albany Nanotech Complex in New York, validating and scaling this light source in the United States.