Fujifilm Plans Rs 800 Crore Semiconductor Materials Facility in India, to Exhibit at SEMICON India 2026
Japanese firm Fujifilm plans to set up a greenfield semiconductor materials manufacturing facility in India with a total investment of around USD 83 million, or around Rs 800 crore, the company said on Wednesday. The investment will be made in two phases, with commercial production expected by fiscal year 2028. The facility will produce front-end process chemicals, surface conditioning materials, and high-purity chemicals. The project aligns with the Indian government’s India Semiconductor Mission (ISM 2.0 policy).
FUJIFILM India will participate at SEMICON India 2026, taking place from September 17–19, 2026, at Yashobhoomi, New Delhi. The company will be located at Hall 1, Booth 623. It will showcase its semiconductor materials portfolio and global technology capabilities. Key highlights include the display of Make in India initiatives and a technology demonstration of the company’s Chemical Mechanical Planarization (CMP) slurry solutions, in which FUJIFILM Electronic Materials holds high market share globally. The demonstration will include a working model showing the precision of its CMP Slurries, capable of achieving polished circuit surface flatness within 0.4 nanometers.
The participation builds on FUJIFILM India’s focus on localisation, customer partnerships and semiconductor supply-chain development in India. In June 2026, FUJIFI...