Intel Foundry Begins High-Volume Production Using ASML's High NA EUV Technology
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ASML Holding N.V. has announced that Intel Foundry is now using ASML's High NA EUV technology on the Intel 18A process node to produce a subset of its Intel Core Ultra Series 3 processors, code-named Panther Lake. The milestone marks an important step in proving High NA EUV readiness within an actual production environment.
Specific Intel 18A process layers are now dual-qualified on High NA EUV at Intel's Oregon facility, with product shipping to customers at yields matching those achieved on the existing NXE platform.
ASML and Intel have worked closely together for decades to advance lithography technology and support continued semiconductor scaling. High numerical aperture extreme ultraviolet (High NA EUV) lithography represents the next major step in EUV technology, developed by ASML to enable more precise patterning for advanced chip manufacturing.
The Intel Core Ultra Series 3 processors are built on the Intel 18A node, and using High NA EUV to pattern specific layers of these chips gives both ASML and Intel Foundry valuable data to further refine system setup, uptime, and manufacturing implementation, helping pave the way toward broader adoption of the technology's full capabilities.
Christophe Fouquet, ASML's President and CEO, said the introduction of...
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