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  Date: 28/02/2015

Improved light source for <14nm semiconductor litho support higher yield

ASML owned Cymer has shipped its first XLR 700ix light source with higher scanner throughput and process stability for printing patterns smaller than 14nm on silicon wafers. Bandwidth and wavelength of laser light is improved and also energy stability is achieved in XLR 700ix to reduce process variability and increase yield through improvements in wafer critical dimension (CD) uniformity. Other improvements include software enhancements to increase light source predictability and availability and reduction in helium and power consumption to decrease operating costs.

Cymer said it also introduced DynaPulse as a product upgrade option for OnPulse customers. Cymer says "DynaPulse enables chipmakers to extend their capital investment and achieve the same performance improvements standard in the XLR 700ix to their ArF immersion installed base. Essentially eliminating bandwidth as a source of variation to improve on-wafer critical dimension (CD) uniformity, the XLR 700ix and DynaPulse utilize the same patented technology to tightly control bandwidth specifications (300+5fm) and achieve stable on-wafer performance."

"Customers have recognized the new performance, process stability and sustainability improvements of the XLR 700ix to enable higher system efficiency for leading-edge manufacturing applications, and are eager to realize the same benefits within their installed base," said Ed Brown, Chief Executive Officer of Cymer Light Source. "DynaPulse now makes it easier for chipmakers to achieve a high level of performance and productivity across their entire ArF immersion light source fleet."

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