Imec and ASML intensify collaboration with advanced EUV pilot line at Imec' facility
Imec and ASML have signed a MoU to install ASML EUV and other advanced lithography and metrology equipment in the imec pilot line in Leuven, Belgium.
The pilot line to help fabricate prototype chips using latest researched semiconductor technologies. Imec, ASML and in collaboration with other partners to explore novel semiconductor applications, materials in a environmentally sustainable way. Imec and ASML to collaborate with all leading-edge chipmakers and materials and equipment ecosystem partners, with the goal to prepare the technology for the fastest possible adoption in mass manufacturing. The team also to develop advanced holistic patterning flows in collaboration with the equipment and material ecosystem. Imec facility to have ASM's latest model 0.55 NA EUV (TWINSCAN EXE:5200), latest models 0.33 NA EUV (TWINSCAN NXE:3800), DUV immersion (TWINSCAN NXT:2100i), Yieldstar optical metrology and HMI multi-beam. The joint imec-ASML High-NA lab is using the first High-NA EUV scanner (TWINSCAN EXE:5000) in phase 1, and in phase 2 it is planned to have High-NA EUV scanner (TWINSCAN EXE:5200) at imec pilot line in Leuven (Belgium). High-NA technology is enabler for developing advanced AI chips which can solve societal challenges such as drug-invention, protecting nature, sustainable ...
The pilot line to help fabricate prototype chips using latest researched semiconductor technologies. Imec, ASML and in collaboration with other partners to explore novel semiconductor applications, materials in a environmentally sustainable way. Imec and ASML to collaborate with all leading-edge chipmakers and materials and equipment ecosystem partners, with the goal to prepare the technology for the fastest possible adoption in mass manufacturing. The team also to develop advanced holistic patterning flows in collaboration with the equipment and material ecosystem. Imec facility to have ASM's latest model 0.55 NA EUV (TWINSCAN EXE:5200), latest models 0.33 NA EUV (TWINSCAN NXE:3800), DUV immersion (TWINSCAN NXT:2100i), Yieldstar optical metrology and HMI multi-beam. The joint imec-ASML High-NA lab is using the first High-NA EUV scanner (TWINSCAN EXE:5000) in phase 1, and in phase 2 it is planned to have High-NA EUV scanner (TWINSCAN EXE:5200) at imec pilot line in Leuven (Belgium). High-NA technology is enabler for developing advanced AI chips which can solve societal challenges such as drug-invention, protecting nature, sustainable ...
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