ASML partners with academic institutes to start Institute for Nanolithography

ASML, the Foundation for Fundamental Research on Matter (FOM), the University of Amsterdam (UvA), the VU University Amsterdam and the Netherlands Organisation for Scientific Research (NWO) announce their intention to establish the Institute for Nanolithography (INL), which will conduct fundamental and applied research in areas that are key to unlocking innovation in the global semiconductor industry. The initial research program of the INL will focus on physical and chemical processes that are key for future extensions of Extreme Ultraviolet (EUV) lithography. This technology is at the forefront of chip manufacturing and is indispensable for innovation in the global semiconductor industry. The institute is expected to make important contributions to semiconductor lithography, which is the key manufacturing technology for making the memory chips and processors in PCs, smartphones and tablets. ASML will provide more than one third of the institute’s annual budget, investing roughly EUR 30 million over 10 years. FOM and NWO will contribute EUR 25 million over 10 years and UvA/VU will make a contribution of EUR 12.5 million. The City of Amsterdam has committed EUR 5 million as start-up funding. The institute is expected to benefit from the government incentive for public-private partnerships (TKI) and plans to raise EUR 25 million from various other funding instruments such a...