Embedded NVM tech from CMT need no extra masks during lithography
Recently founded semiconductor company Chip Memory Technology Inc. (CMT) has said Chrontel has licensed its LogicFlash embedded non-volatile memory (NVM) technology for volume production in multiple Chrontel ICs.
CMT's LogicFlash embedded NVM technology requires no extra foundry steps or extra mask layers. CMT says this radically reduces the expense and delay required to qualify and port chip designs that use LogicFlash to new foundries or new processes. Chrontel is currently incorporating LogicFlash into devices being produced in a 130nm standard logic process.
"Chrontel's high-volume applications demand integrated NVM solutions that offer clear benefits in cost, yield and manufacturability," explained Chrontel CEO and president Dr. David Soo. "LogicFlash offers us advantages that are not available with other embedded NVM technologies."
CMT says competing embedded NVM technologies require as many as 10 additional masks and 20 to 30 additional process steps when implemented on a standard logic process. By eliminating the requirement for extra masks and process steps, LogicFlash is highly portable and scalable, while supporting densities up to 4Mbit, claims CMT.
"We are pleased to offer our latest technology to Chrontel, a company whose products are used in high-volume by computing and display manufacturers worldwide," said CMT founder and CEO, Dr. Wingyu Leung. "By utilizing standard logic processes without modification, LogicFlash offers customers like Chrontel the ultimate in supply chain flexibility, scalability and low-cost."