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Date:10th June 2012
Oxide semiconductor tech from Sharp to
improve LCD panel performance
Sharp Corporation and Semiconductor Energy Laboratory Co.,
Ltd. have jointly developed a new oxide semiconductor (IGZO)
technology with high crystallinity. IGZO is developed to
achieve higher resolutions, lower power consumption, and
higher performance touch screens, as well as narrower bezel
widths for LCD display panels used in mobile devices such
as smartphones. Details of this new development was presented
at the 2012 SID Display Week Symposium held in Boston, USA,
on June 5.
Sharp explains this jointly developed new IGZO technology
imparts crystallinity in an oxide semiconductor composed
of indium (In), gallium (Ga) and zinc (Zn). Compared to
current amorphous IGZO semiconductors, it enables even smaller
thin-film transistors to be achieved and provides higher
performance.
This new material is expected to be adopted for use in LCD
displays for mobile devices and in organic EL displays
Although challenges to commercialization remain in terms
of both service life and production, the two companies will
continue to push ahead with R&D in anticipation of future
market needs, says Sharp.
Specifications of prototype displays
LCD display :
| LCD display |
| Screen size |
4.9 inch |
6.1 inch |
| Resolution (pixels) |
720 x 1280 |
2560 x 1600 |
| Pixel density |
302 ppi |
498 ppi |
| Envisioned application |
Smartphones |
Mobile devices |
Organic EL display :
| Organic EL display |
| Screen size |
13.5 inch |
3.4 inch |
| Resolution (pixels) |
3840 x 2160 (QFHD) |
540 x 960 |
| Pixel density |
326 ppi |
326 ppi |
| Outstanding feature |
White OLEDs + RGB color filters |
Flexible type |
Author: Srinivasa Reddy N
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