ee Herald                                  
Home | News | New Products | India Specific | Design Guide | Sourcing database | Student Section | About us | Contact us | What's New

News

  Date: 1st Nov 2010

Synopsys supports Carl Zeiss SMS' registration metrology tool for in-die metrology solutions

Carl Zeiss SMS and Synopsys, Inc. have collaborated to support the ZEISS tool family for in-die metrology solutions for the 32nm technology node and below. Synopsys will offer support for ZEISS' PROVE, the registration metrology tool, through Synopsys' CATS, mask data preparation solution.

Synopsys says the new PROVE system meets the demands with its concept of 193-nm illumination optics. It delivers an in-die metrology capability for measurement of the smallest production features without placing registration marks, enabling mask makers to measure and analyze registration in critical areas on the mask.

"With Synopsys' long-term experience in mask data preparation and Carl Zeiss' know-how in in-die metrology, the new CATS module with its exciting capabilities will significantly help to reduce mask registration errors on arbitrary production features," said Dr. Dirk Beyer, product manager for PROVE at Carl Zeiss SMS GmbH.

"Synopsys' collaboration with Carl Zeiss exemplifies our commitment to offering comprehensive lithography, inspection and metrology solutions to the mask manufacturing market," said Fabio Angelillis, vice president of engineering for Synopsys' Silicon Engineering Group. "By extending CATS to support PROVE, we are delivering higher quality metrology solutions to our customers at the 32-nanometer technology node and below," he added.

          
Home | News | New Products | India Specific | Design Guide | Sourcing database | Student Section | About us | Contact us | What's New
©2010 Electronics Engineering Herald