SUSS MicroTec AG has installed its 2nd-generation nanostructuring prototype tool. This tool is built using exclusive license from Rolith's RML-2 tool. This prototype is based on new nanolithography method called Rolling Mask Lithography (RML) developed by Rolith, Inc. It enables users to create nanostructures over large areas – up to 1m x 0.3 m - of substrate materials in a high throughput and cost effective manner, as per Rolith.
Rolling Mask Lithography can be used in building high efficiency semiconductor solar PV cells, high brightness LEDs and many nanotechnology based products. Rolith has used near-field optical lithography using cylindrically shaped rolling masks. The masks are manufactured by Rolith and can be customized to fit specific customer’s application requirements. Sub-wavelength resolution is achieved by phase-shift interference effect or plasmonic enhancement printing structures. Continuous rolling mask lithography has the potential to offer high throughput at low cost, claim Rolith.
Rolith says RML process is quite tolerant to substrate non-flatness, which is beneficial for processing architectural glass windows or sapphire LED wafers.
“We are very happy with the progress of development of our new lithography concept. Now, with the 2nd generation of Rolith’s lithography tools in the field, we can effectively address a rapidly growing interest in this technology from multiple industries,” said Dr. Boris Kobrin, founder and CEO, Rolith.
“The innovative optical nanolithography technology by Rolith together with our equipment solution allows printing of very small structures. With continuous rolling mask lithography, processing large substrate sizes is possible offering a completely new capability to our customers,” said Mr. Frank Averdung, President and CEO SÜSS MicroTec AG.
“This progress could enable us to create nanostructures over large areas and to apply in variety of markets.” said Mr. Hiroshi Usui, General Manager of AGC America, Inc.